XUV Piezo Cluster

The XUV Optics Group in MESA+ Institute at University of Twente tends to invest in the XUV Piezo Cluster to carry research on piezoelectric film-based sensors and actuators. The aim is to scale up the piezoelectric film coating capabilities to larger substrate dimensions with more advanced process control systems that …

CPV: 38000000 Laboratory, optical and precision equipments (excl. glasses)
Deadline:
Jan. 13, 2025, 11 a.m.
Deadline type:
Submitting a bid
Place of execution:
XUV Piezo Cluster
Awarding body:
Universiteit Twente
Award number:
EB-OUT 6528

1. Buyer

1.1 Buyer

Official name : Universiteit Twente
Legal type of the buyer : Body governed by public law
Activity of the contracting authority : Education

2. Procedure

2.1 Procedure

Title : XUV Piezo Cluster
Description : The XUV Optics Group in MESA+ Institute at University of Twente tends to invest in the XUV Piezo Cluster to carry research on piezoelectric film-based sensors and actuators. The aim is to scale up the piezoelectric film coating capabilities to larger substrate dimensions with more advanced process control systems that enable to explore a broader process window.   The XUV Piezo Cluster will be used for the deposition of pure metals, metallic oxides and piezoelectric layers onto various substrates to be further processed using photolithography and deposition steps in the MESA+ Nanolab facilities. Brief description of the capabilities is outlined below:   The XUV Piezo Cluster shall be capable of processing at least 200 mm diameter substrates.   The XUV Piezo Cluster shall include a chamber for deposition of piezoelectric Pb(Zr,Ti)O3 (PZT) layer that acts as the active layer for sensor and actuator applications.   The XUV Piezo Cluster shall include a chamber or chambers for deposition of pure metals such as Pt, gold (Au) or conductive metal oxides such as LaNiO3 or SrRuO3 layers. The XUV Piezo Cluster shall have the capability to sputter the typically used Ti, Ta or Cr adhesion layers preceding the pure metal layers.  The XUV Piezo Cluster shall include a load-lock chamber for fast sample loading and reaching of the base pressure.   The XUV Piezo Cluster shall include a transfer chamber enabling the transfer of substrates between deposition chambers without breaking the vacuum.   The XUV Piezo Cluster shall be further expandible to include a pre-treatment chamber for purposes such as degassing or etching before or after the layers are deposited.   The full technical specifications can be found in ‘Appendix B: Schedule of Demands and Wishes’. Tenderers can derive no rights from the indicative specification. All amounts are specified excluding VAT.
Procedure identifier : a56cdde3-e149-4cd1-97ff-45fdbc4d9957
Internal identifier : EB-OUT 6528
Type of procedure : Open
Justification for the accelerated procedure :
Main features of the procedure :

2.1.1 Purpose

Main nature of the contract : Supplies
Main classification ( cpv ): 38000000 Laboratory, optical and precision equipments (excl. glasses)

2.1.2 Place of performance

Country : Netherlands
Anywhere in the given country
Additional information : Zie documentatie

2.1.3 Value

Estimated value excluding VAT : 1 900 000 Euro

2.1.4 General information

Legal basis :
Directive 2014/24/EU

2.1.6 Grounds for exclusion

Corruption : See UEA
Participation in a criminal organisation : See UEA
Money laundering or terrorist financing : See UEA
Fraud : See UEA
Child labour and other forms of trafficking in human beings : See UEA
Terrorist offences or offences linked to terrorist activities : See UEA

5. Lot

5.1 Lot technical ID : LOT-0000

Title : XUV Piezo Cluster
Description : The XUV Optics Group in MESA+ Institute at University of Twente tends to invest in the XUV Piezo Cluster to carry research on piezoelectric film-based sensors and actuators. The aim is to scale up the piezoelectric film coating capabilities to larger substrate dimensions with more advanced process control systems that enable to explore a broader process window.   The XUV Piezo Cluster will be used for the deposition of pure metals, metallic oxides and piezoelectric layers onto various substrates to be further processed using photolithography and deposition steps in the MESA+ Nanolab facilities. Brief description of the capabilities is outlined below:   The XUV Piezo Cluster shall be capable of processing at least 200 mm diameter substrates.   The XUV Piezo Cluster shall include a chamber for deposition of piezoelectric Pb(Zr,Ti)O3 (PZT) layer that acts as the active layer for sensor and actuator applications.   The XUV Piezo Cluster shall include a chamber or chambers for deposition of pure metals such as Pt, gold (Au) or conductive metal oxides such as LaNiO3 or SrRuO3 layers. The XUV Piezo Cluster shall have the capability to sputter the typically used Ti, Ta or Cr adhesion layers preceding the pure metal layers.  The XUV Piezo Cluster shall include a load-lock chamber for fast sample loading and reaching of the base pressure.   The XUV Piezo Cluster shall include a transfer chamber enabling the transfer of substrates between deposition chambers without breaking the vacuum.   The XUV Piezo Cluster shall be further expandible to include a pre-treatment chamber for purposes such as degassing or etching before or after the layers are deposited.   The full technical specifications can be found in ‘Appendix B: Schedule of Demands and Wishes’. Tenderers can derive no rights from the indicative specification. All amounts are specified excluding VAT.
Internal identifier : EB-OUT 6528

5.1.1 Purpose

Main nature of the contract : Supplies
Main classification ( cpv ): 38000000 Laboratory, optical and precision equipments (excl. glasses)

5.1.2 Place of performance

Country : Netherlands
Anywhere in the given country
Additional information : Zie documentatie

5.1.3 Estimated duration

Other duration : Unknown

5.1.5 Value

Estimated value excluding VAT : 1 900 000 Euro

5.1.6 General information

Reserved participation : Participation is not reserved.
Procurement Project not financed with EU Funds.
The procurement is covered by the Government Procurement Agreement (GPA) : no

5.1.9 Selection criteria

Criterion :
Type : Economic and financial standing
Name : Cover for liability risk
Description : See Descriptive document
Use of this criterion : Not used
Criterion :
Type : Suitability to pursue the professional activity
Name : Registration in Trade register
Description : See Descriptive document
Use of this criterion : Used
Criterion :
Type : Technical and professional ability
Name : Experience Tenderer
Description : See descriptive document
Use of this criterion : Used

5.1.11 Procurement documents

Address of the procurement documents : https://s2c.mercell.com/today/119146

5.1.12 Terms of procurement

Terms of submission :
Electronic submission : Allowed
Languages in which tenders or requests to participate may be submitted : English
Electronic catalogue : Not allowed
Deadline for receipt of tenders : 13/01/2025 11:00 +00:00
Information about public opening :
Opening date : 14/01/2025 11:00 +00:00
Terms of contract :
The execution of the contract must be performed within the framework of sheltered employment programmes : No
Electronic invoicing : Required
Electronic ordering will be used : no
Electronic payment will be used : yes

5.1.15 Techniques

Framework agreement :
No framework agreement
Information about the dynamic purchasing system :
No dynamic purchase system
Electronic auction : no

5.1.16 Further information, mediation and review

Review organisation : Rechtbank Overijssel

8. Organisations

8.1 ORG-0001

Official name : Universiteit Twente
Registration number : 50130536
Postal address : Drienerlolaan 5
Town : Enschede
Postcode : 7522NB
Country : Netherlands
Contact point : Camilio Delfgaauw
Telephone : +31534891512
Internet address : https://www.utwente.nl
Roles of this organisation :
Buyer

8.1 ORG-0002

Official name : Rechtbank Overijssel
Registration number : 82940525
Town : Almelo
Country : Netherlands
Telephone : (+31)0883611042
Roles of this organisation :
Review organisation

11. Notice information

11.1 Notice information

Notice identifier/version : 2f9b33d3-2fc7-4c94-a0e8-d1b8244a9779 - 01
Form type : Competition
Notice type : Contract or concession notice – standard regime
Notice dispatch date : 08/11/2024 08:16 +00:00
Notice dispatch date (eSender) : 08/11/2024 13:15 +00:00
Languages in which this notice is officially available : English

11.2 Publication information

Notice publication number : 00683630-2024
OJ S issue number : 219/2024
Publication date : 11/11/2024